GREEN WORLD WITH HANSO
Application Field
Ion Implant Process, Ashing Process, Epi Process, Chemical Vapor Deposition(CVD) Process, For reducing of Acid Vapors such as Cl2, F2, etc.
Characteristic
Appearance
Reaction Mechanism
Gas | Mechanism | TLV (ppm) |
---|---|---|
Cl2 | Cl2 + 2MOH → 2MCl + H2O + 1/2O2 | 1 |
Cl2 + M(OH)2 → MCl2 + H2O + 1/2O2 |