GREEN WORLD WITH HANSO
Application Field
Ion Implant Process, Ashing and Etching Process, Epi Process, Some Chemical Vapor Deposition(CVD) Process, For reducing of SiH4 gas, etc.
Characteristic
Appearance
Reaction Mechanism
Gas | Mechanism | TLV (ppm) |
---|---|---|
SiH4 | SiH4 + 2MOH → M2Si + 2H2O + H2 | 5 |