About Products

Application Field

반도체 제조공정, TFT-LCD 생산공정, 태양전지 비 정질 실리콘 박막 제조공정 및 기타 발생원 등에서 발생하는 잔여 PFCs(NF3, CF4, SF6, CF4, C2F6, C3F8, c-C4F8 등 과불화합물) 처리

Characteristic

  • Appearance & Size : Granules (4x8 mesh)
  • Color : Dark navy
  • Bulk density : ~0.4g/cc
  • Crush strength : > 4.0 kgf/㎠
  • Recomm. operating temp. : 400~800℃
  • Upper temp. limit : < 1,000℃

Appearance

Reaction Mechanism

Gas Mechanism
NF3, CHF3, SF6, CF4, C2F6, C3F8, c-C4F8 XFn + M → MF + XO(XO2)
XFn + H2O → HF + XO(XO2)

PFC Destruction – Effects of PFC