GREEN WORLD WITH HANSO
Application Field
이온주입(Ion Implant)공정, 에슁(Ashing)/에칭(Etching)공정, Epi공정, 화학증착(CVD)공정, SiH4 등 가스제거용
Characteristic
Appearance
Reaction Mechanism
| Gas | Mechanism | TLV (ppm) |
|---|---|---|
| SiH4 | SiH4 + 2MOH → M2Si + 2H2O + H2 | 5 |