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Application Field
반도체 제조공정, TFT-LCD 생산공정, 태양전지 비 정질 실리콘 박막 제조공정 및 기타 발생원 등에서 발생하는 잔여 PFCs(NF3, CF4, SF6, CF4, C2F6, C3F8, c-C4F8 등 과불화합물) 처리
Characteristic
- Appearance & Size : Granules (4x8 mesh)
- Color : Dark navy
- Bulk density : ~0.4g/cc
- Crush strength : > 4.0 kgf/㎠
- Recomm. operating temp. : 400~800℃
- Upper temp. limit : < 1,000℃
Appearance
Reaction Mechanism
| Gas | Mechanism |
|---|---|
| NF3, CHF3, SF6, CF4, C2F6, C3F8, c-C4F8 | XFn + M → MF + XO(XO2) |
| XFn + H2O → HF + XO(XO2) |
PFC Destruction – Effects of PFC
