Application Field
Ion Implant Process, Ashing Process, Epi Process, Chemical Vapor Deposition(CVD) Process, For reducing of Acid Vapors such as Cl2, F2, etc.
Characteristic
Appearance
Reaction Mechanism
Gas | Mechanism | TLV (ppm) |
---|---|---|
Cl2 | Cl2 + 2MOH → 2MCl + H2O + 1/2O2 | 1 |
Cl2 + M(OH)2 → MCl2 + H2O + 1/2O2 |